KOBELCO PVD TECHNOLOGY
Coating Equipments

Arc Ion Plating AIP®-S series

The AIP®-S series is a batch system using the Arc Ion Plating (AIP®) method. This flexible system can be used for a wide variety of coating applications. The AIP®-S series achieves smooth surfaces while maintaining a high deposition rate.

Features

  1. 1. Droplets, a major defect of Cathodic arc deposition, are successfully minimized by AIP®.
  2. 2. Thick & dense film with extremely smooth surface
  3. 3. High deposition rate by High energy density & High ionization
  4. 4. Multi-layer films & multi process films are possible
Super Fine Cathode
Plasma range extended
by SFC
Learn more  
Fine Cathode
Plasma Enhanced
Cathode
Normal Cathode
Conventional
Cathode

New Technology

Recently we have launched the SFC (Super Fine Cathode), a newly developed cathode which has advantages due to tuning the magnetic field around the cathode.

  • Residual stress is adjustable by substrate bias while covering all range of existing AIP® cathodes.
  • Thick coatings (up to 20 μm) with low internal stress is possible
  • Boltless structure enables to change targets with one-touch operation
  • Productivity is increased by improvement of yield rate of target (20 % up)

Coating Thickness Distribution

Machine Lineup

AIP AIP-S20 AIP-S40 AIP-S70
Production scale R&D medium scale production large scale production
Recommended
Loading Space
φ 220mm
x H 120mm
φ 450mm
x H 500mm
or
φ 130mm
x H 500mm
x 6 spindles
φ 700mm
x H 700mm
or
φ 130mm
x H 700mm
x 12 spindles
Arc Evaporation
Source
1 to 3 6 to 12 8 to 16
Substrate Table Multi Spindles planetary 6-Spindles planetary rotary table 12-Spindles planetary rotary table

Effect of Fine Cathode

Turning
Material: Carbide, Work Piece: AISI 316, Cutting Speed: 270 [m/min], Coolant: Wet
Milling Test
Material: Carbide, Workpiece: AISI A48-94a, Cutting speed: 220 [m/min], Coolant: Dry,

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